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Abstraction NBTI model

dc.contributor.authorAdolf, Stephan
dc.contributor.authorNebel, Wolfgang
dc.date.accessioned2022-01-18T11:29:52Z
dc.date.available2022-01-18T11:29:52Z
dc.date.issued2021
dc.description.abstractNegative Bias Temperature Instability (NBTI) is one of the major transistor aging effects, possibly leading to timing failures during run-time of a system. Thus one is interested in predicting this effect during design time. In this work an Abstraction NBTI model is introduced reducing the state space of trap-based NBTI models using two abstraction parameters, applying a state transformation to incorporate variable stress conditions. This transformation is faster than traditional approaches. Currently the conversion into estimated threshold voltage damages is a very time consuming process.en
dc.identifier.doi10.1515/itit-2021-0005
dc.identifier.pissn2196-7032
dc.identifier.urihttps://dl.gi.de/handle/20.500.12116/37957
dc.language.isoen
dc.publisherDe Gruyter
dc.relation.ispartofit - Information Technology: Vol. 63, No. 4
dc.subjectTransistor aging
dc.subjectNegative Bias Temperature Instability
dc.subjectNBTI
dc.subjectAging simulation
dc.subjectReliability
dc.titleAbstraction NBTI modelen
dc.typeText/Journal Article
gi.citation.endPage310
gi.citation.publisherPlaceBerlin
gi.citation.startPage299

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